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1.  High Resolution X-Ray Diffractometer (XRD) system with one dimensional solid state detector and  multilayer mirror type monochromator for powder and thin film samples.

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2.  Atomic Force Microscope (AFM) for materials characterization.

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3. Alternate Layer Langmuir-Blodgett Trough (area ~ 2x1000 cm.sq) automated system for depositing thin multilayer films. 

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4. Fully Automated Semiconductor Characterization System for current-voltage, capacitance-voltage  and pulsed current-voltage measurements.

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